ASML EUV Lithography Expansion: 2028 Capacity Target of 110 Units
2026-09-16
Customer Demand Surges
ASML's EUV lithography machine customers mainly include TSMC, Samsung Electronics, and Intel. Against the backdrop of continued explosive growth in AI chip demand, the capacity expansion plans of these three advanced-process manufacturers are accelerating. Christophe Fouquet, President and CEO of ASML, noted at the company's Q1 2026 earnings call that customers are accelerating their capacity expansion plans for 2026 and the long term, and that in recent months they have raised their short- and medium-term demand expectations for ASML products. In memory chips, customers said that 2026 is already undersupplied, and that this situation will continue beyond 2026. In advanced logic chips, customers are expanding capacity for different process nodes.
It is worth noting that NVIDIA itself does not directly manufacture most GPUs, but instead relies on foundries including TSMC to produce chips, and the key equipment used by these advanced chip manufacturers is precisely the EUV lithography machines supplied by ASML. Therefore, ASML's capacity expansion progress, to some extent, determines the upper limit of global AI compute chip supply.
Technology Upgrades
While expanding capacity, ASML is also continuously advancing the iterative upgrading of lithography technology. In light source technology, ASML has successfully upgraded its tin droplet generator technology, doubling the number of tin droplets to about 100,000 per second, and increasing light source power from 600W to 1,000W. The upgraded equipment can process about 330 wafers per hour, compared with 220 at present, and is expected to increase chip output by 50% by 2030.
In next-generation High NA EUV, ASML has announced cooperation with three leading advanced-process companies—Samsung Electronics, TSMC, and Intel—to jointly promote the transition of High NA EUV lithographic patterning systems from traditional 6-inch masks to 12-inch masks, in order to improve machine productivity and resolve the stitching issue in the current approach.
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